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1铌溅射靶材Niobium sputtering target_副本
1铌靶材-光学通讯
1铌溅射靶材Niobium sputtering target_副本
1铌靶材-光学通讯
Niobium target
Niobium is a kind of refractory rare metal with a steel-gray luster. Its melting point is 2467℃ and its density is 8.6g/cm3. Niobium has good low-temperature plasticity and can be cold-pressed into rods, sheets, wires and other products. Niobium can withstand high temperature and high strength, and still has sufficient strength, plasticity and thermal conductivity above 1000°C. Superconductivity is best at extremely low temperatures. For example, its resistance is close to zero at minus 260°C. It is currently the most important superconducting material.
0.0 0.0
Product description

Description

Niobium is a kind of refractory rare metal with a steel-gray luster. Its melting point is 2467℃ and its density is 8.6g/cm3. Niobium has good low-temperature plasticity and can be cold-pressed into rods, sheets, wires and other products. Niobium can withstand high temperature and high strength, and still has sufficient strength, plasticity and thermal conductivity above 1000°C. Superconductivity is best at extremely low temperatures. For example, its resistance is close to zero at minus 260°C. It is currently the most important superconducting material.

 

Application

Niobium and high-temperature niobium-tungsten alloy materials are widely used in aerospace engines, weapon propellers, rocket missile liquid two-component engines, nuclear reactors, submersibles, gas turbines, automobile engines, diesel engines, high-temperature furnace heating belts, high-temperature molds, high-temperature fixtures And the manufacture of high-temperature crucibles. Specification size Thickness (0.15~6.0)mm × width (50~300)mm×length (50~1000)mm, customer's special size and requirements can be negotiated

 

Chemical composition

Brand

Chemical composition ,≯(%)

Nb1

Fe

Si

Ni

W

Mo

Ti

Cr

0.005

0.005

0.005

0.010

0.010

0.002

0.002

O

C

H

N

Ta

Nb

 

0.020

0.020

0.001

0.01

0.10

Matrix

 

Nb2

Fe

Si

Ni

W

Mo

Ti

Cr

0.01

0.005

0.005

0.020

0.010

0.005

0.005

O

C

H

N

Ta

Nb

 

0.040

0.030

0.005

0.025

0.25

Matrix

 

 

 

1铌溅射靶材Niobiumsputteringtarget

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欧泰稀材
Ruthenium target, Ru sputtering target
Ruthenium target is mainly used in the field of vacuum coating<br> Purity: 99.95%<br> Uses: vacuum coating, experimental or research grade ruthenium targets, electronics, optoelectronics, military, decorative coating, functional films, etc.
osmium target, Os sputtering target
Chemical purity: 99.95%<br> Size: Diameter 20~300mm, thickness 1~60mm, customized according to requirements<br> Application: Osmium target is mainly used in the field of vacuum coating
High purity titanium target
Purity: 4N-5N <br> Dimensions: diameter 50~400mm, thickness 3~28mm<br> Can be customized according to customer requirements
Iridium target, Ir sputtering target
Purity: 3N5<br> Size: 1-10 inches, unconventional size can be customized<br> Application The high temperature oxidation resistance and thermoelectric properties of iridium make the iridium/iridium rhodium thermocouple the only precious metal temperature measurement material that can measure high temperatures up to 2100℃ in the atmosphere.
Gold target
Chemical purity:99.99%<br> Size: Diameter 20~300mm, thickness 1~60mm according to requirements
Silver target
Chemical purity: 99.99%<br> Size: Diameter 20~300mm, thickness 1~60mm according to requirements
Rhenium target, rhenium sputtering target
Specifications: Purity Re≥99.99%~99.999%, shape, size and density accept various customized products. <br> Rhenium target material is used for magnetron sputtering coating. Magnetron sputtering coating is a new type of physical vapor (PVD) coating method. Compared with evaporation coating method, it has obvious advantages in many aspects. A more mature technology, magnetron sputtering has been used in many fields, such as semiconductor integrated circuits, solar photovoltaics, recording media, flat-panel displays, and workpiece surface coatings.
Copper target
We can produce copper targets of various purity and requirements with a purity of 99.9%~99.9999%. The oxygen content can be as low as <1ppm. It is mainly used for display screen and touch screen wiring and its protective film, solar light absorption layer, semiconductor wiring, etc. industry.
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