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osmium target, Os sputtering target
锇靶
锇靶
osmium target, Os sputtering target
Chemical purity: 99.95%
Size: Diameter 20～300mm, thickness 1～60mm, customized according to requirements
Application: Osmium target is mainly used in the field of vacuum coating
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Product description

Application

Osmium targets are mainly used in the field of vacuum coating

 

Product specifications

Chemical purity Size

99.95% ，99.98%

 Diameter 20～300mm, thickness 1～60mm,

customized according to requirements

 

Typical chemical analysis

Impurity element ≯（﹪）

Au

Mg

Si

Fe

Pt

Ni

0.001

0.002

0.02

0.02

0.001

0.002

Al

Ir

Pd

Cu

Ag

Rh

0.01

0.001

0.002

0.002

0.001

0.002
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Osmium cube
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