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Ten sectors of high-end specialty rare-material products Specializing in the production of rares metals and finished products

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CT machine X-ray tube anode rotating target

When the CT tube is working, the anode target produces X-rays under the bombardment of high-energy electron beams, but the energy conversion efficiency is very low. Only about 1% of the energy is converted into X-ray energy, and the remaining 99% of the energy is converted into heat energy. The local temperature can be as high as 2600°C. Therefore, the rotating anode target needs to have the characteristics of high high temperature strength, good thermal shock resistance, and fast heat dissipation. Therefore, the density of the target material, the content of alloy impurity elements, and the brazing bonding strength of graphite and molybdenum alloys affect the service life of the target. Key factor.
2020-12-11

MOCVD irreplaceable "rhenium" heater member

Tungsten heating devices will become brittle after being recrystallized after being used at high temperature, and will easily break under impact or vibration. Compared with tungsten, rhenium has a higher recrystallization temperature, and the recrystallized rhenium is not a brittle material, but its strength is reduced. As a non-stressed heating device, it still has good working ability and has the best high temperature stability. High creep strength. Therefore, rhenium is used to manufacture MOCVD heating devices. It is the most appropriate choice in consideration of performance and cost. No other material can replace it.
2020-12-11

About rhenium technology

Rhenium is a sparse, refractory metal. Scattered means that the content of rhenium in the earth's crust is scarce and dispersed, and refractory means that the melting point of rhenium metal is extremely high, with a melting point of 3180°C, second only to tungsten, ranking second among all metals. Because of its compound's excellent properties such as catalytic activity, high temperature resistance, and corrosion resistance, it is mainly used in petroleum smelting catalysts, thermoelectric superalloys, electronic tube structural materials, special aerospace alloys, and environmental protection.
2020-12-01

About MOCVD

MOCVD (Metal Organic Chemical Vapor Deposition, metal organic chemical vapor deposition) technology, also known as OMVPE, MOVPE, etc., is a new technology for preparing compound semiconductor single film proposed by Rockwell in 1968. The MOCVD method is to decompose and react the metal organic compound diluted in the carrier gas and the hydride of the V or VI element on the heated epitaxial substrate, and the reaction product is deposited on the epitaxial substrate to form A kind of epitaxial film technology, the use of this technology can grow nano-level high-quality film, it is precisely because of this feature that MOCVD technology is widely used in the production and manufacturing of semiconductor devices. T
2020-12-01

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2020

12 11

At 20:11 on July 9, 2020, the Asia-Pacific 6D communications satellite was successfully launched by the Long March 3B carrier rocket at the Xichang Satellite Launch Center. The Asia-Pacific 6D communication satellite is a high-throughput broadband communication satellite in geostationary orbit. It was developed by the Communications Satellite Division of the Fifth Academy of Aerospace Science and Technology Group (hereinafter referred to as the Fifth Academy), and adopted the new-generation Dongfanghong-4 enhanced version independently developed by my country. The satellite public platform (DFH-4E platform) is built with a launch weight of about 5550 kg and a service life of 15 years in orbit. Up to now, the Fifth Academy has developed and launched 304 spacecraft.

2020

12 11

Today, the third-generation semiconductor materials represented by silicon carbide (SiC) and gallium nitride (GaN) have received great attention, and their role in high-power, high-temperature, and high-voltage applications is not traditional Comparable to silicon devices. Especially with the increasingly stringent requirements for high-performance semiconductor materials in emerging high-tech fields such as new energy and 5G, the third-generation semiconductor materials are destined to further shine.

2020

12 11

Each metal has a different value, which depends on the rarity of the metal, the difficulty of extraction and the characteristics of the metal. Throughout history, precious metals have always been traded as currencies, and now they have become a form of investment. When you think of precious metals, the first thing you think of should be gold and silver. Although the price of gold and silver is also very expensive, and has been included in the top ten most precious metals. But there are other metals that are more valuable than gold and silver. The following 10 are the most expensive metals in the world in 2020, let us take a look.

2020

12 01

Pure tungsten materials with a purity of 99.999% (5N) and 99.9999% (6N) are called high-purity tungsten. The total impurity element content of high-purity tungsten should be controlled between 1 ppm and 10 ppm (10-6~10-5). For some special impurity elements, such as radioactive elements, alkali metal elements, heavy metal elements and gases Elements etc. also have special requirements. Since the radioactive elements U and Th have a rays, they can cause "soft errors" in the memory circuit and affect the quality and performance of the circuit. Therefore, in the impurity elements of high-purity tungsten, the content of U and Th should be particularly low. Said it should be as low as 1 ppb (that is, 1×10-9) or less, and as low as 0.1 ppb (1×10-10). In addition, high-purity tungsten also has strict requirements on the content of alkali metal elements (K, Na, Li). High-purity tungsten is mainly prepared into pure metal targets or alloy targets, and functional films that meet the requirements are obtained by magnetron sputtering. Because high-purity tungsten (5 N or 6 N) has high resistance to electron migration, high-temperature stability and the ability to form stable silicides, it is used as a gate, connection and barrier metal in the form of thin films in the electronics industry. High-purity tungsten and tungsten silicon and tungsten-titanium sputtering targets are often applied in the form of thin films for ultra-large-scale integrated circuits as resistance layers, diffusion barriers, transition layers, etc., and as gate materials and connections in metal oxide semiconductor transistors Materials, etc. The rapid development of modern electronics, semiconductors, and photovoltaic industries has almost exacting and perfect purity requirements for materials, especially metal materials. High-purity tungsten plays a very important role due to its extremely high performance.