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Top ten high-end specialty thin material products

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1高纯铜靶
1铜靶材-TP
1高纯铜靶
1铜靶材-TP
Copper target
We can produce copper targets of various purity and requirements with a purity of 99.9%~99.9999%. The oxygen content can be as low as <1ppm. It is mainly used for display screen and touch screen wiring and its protective film, solar light absorption layer, semiconductor wiring, etc. industry.
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Product description

We can produce copper targets of various purity and requirements with a purity of 99.9%~99.9999%. The oxygen content can be as low as <1ppm. It is mainly used for display screen and touch screen wiring and its protective film, solar light absorption layer, semiconductor wiring, etc. industry. In addition to meeting the needs of customers for flat targets (the largest G8.5 generation), we can also produce copper rotating targets, which are mainly used in the touch screen industry. The crystal grains of the high-purity copper target are difficult to break. We can only control the growth of the crystal by super large deformation processing to obtain a fine and uniform microstructure, so as to ensure that the sputtering coating can obtain a lower erosion rate and reduce Sensitivity to particle formation during sputtering. The following figure shows two typical microscopic metallographic inspection pictures of copper sputtering targets, with an average particle size <50um.

 

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Impurities in the copper sputtering target will reduce the conductivity of the material, and impurity elements are the main factor affecting the yield in the production of semiconductor films. Impurities in the form of titanium, phosphorous, calcium, iron, chromium and selenium are particularly critical. These metals are very low in our copper targets, and their impurity content is far below the standard value required by customers. The following table is the composition analysis certificate of the 4N high-purity copper sputtering target. The analysis methods used are: 1. Use GDMS or ICP-OES to analyze metal elements; 2. Use LECO for gas element analysis.

 

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Ruthenium target, Ru sputtering target
Ruthenium target is mainly used in the field of vacuum coating<br> Purity: 99.95%<br> Uses: vacuum coating, experimental or research grade ruthenium targets, electronics, optoelectronics, military, decorative coating, functional films, etc.
osmium target, Os sputtering target
Chemical purity: 99.95%<br> Size: Diameter 20~300mm, thickness 1~60mm, customized according to requirements<br> Application: Osmium target is mainly used in the field of vacuum coating
In2Se3 target
Purity: 99.99%<br> Size: 50.8mm-300mm<br> In2Se3 is mainly used as semiconductors, photoconductive materials, optical and electrical sensors. <br>
CIGS target
Purity: 99.99%<br> Size: 50.8mm-300mm<br> CIGS thin-film solar cells, composed of four elements Cu (copper), In (indium), Ga (gallium), and Se (selenium), constitute the best proportion of chalcopyrite crystal thin-film solar cells, which are the key technologies for solar panels. Because this product has many advantages such as strong light absorption capacity, good power generation stability, high conversion efficiency, long power generation time during the day, high power generation, low production cost and short energy recovery cycle, CIGS solar cells are already the future of solar cell products. star. <br> Can be customized according to customer requirements<br>
Iridium target, Ir sputtering target
Purity: 3N5<br> Size: 1-10 inches, unconventional size can be customized<br> Application The high temperature oxidation resistance and thermoelectric properties of iridium make the iridium/iridium rhodium thermocouple the only precious metal temperature measurement material that can measure high temperatures up to 2100℃ in the atmosphere.
Gold target
Chemical purity:99.99%<br> Size: Diameter 20~300mm, thickness 1~60mm according to requirements
Silver target
Chemical purity: 99.99%<br> Size: Diameter 20~300mm, thickness 1~60mm according to requirements
Rhenium target, rhenium sputtering target
Specifications: Purity Re≥99.99%~99.999%, shape, size and density accept various customized products. <br> Rhenium target material is used for magnetron sputtering coating. Magnetron sputtering coating is a new type of physical vapor (PVD) coating method. Compared with evaporation coating method, it has obvious advantages in many aspects. A more mature technology, magnetron sputtering has been used in many fields, such as semiconductor integrated circuits, solar photovoltaics, recording media, flat-panel displays, and workpiece surface coatings.
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