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1高纯铝靶
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1高纯铝靶
1铝靶材-LCD
Aluminum target
3N8-4N8 aluminum is mostly used for rolling aluminum foil of electrolytic capacitors, lighting fixtures and data storage. 5N-6N ultra-pure aluminum is mostly used in manufacturing semiconductor devices, manufacturing optoelectronic storage media, superconducting cable stabilization materials, and playing an important role in space shuttle scientific research. The picture below is the microscopic metallographic inspection picture of aluminum sputtering target, the average particle size is <300μm. We produce high-purity aluminum sputtering targets. Its biggest advantage is that in the process of physical vapor deposition, a thin film with excellent conductivity and particle minimization can be obtained. The following table is a certificate of composition analysis of 5N high-purity aluminum sputtering target.
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Product description

Aluminum is a silver-white light metal. There is malleability. Commodities are often made into rods, sheets, foils, powders, ribbons and filaments. It can form an oxide film to prevent metal corrosion in humid air. Aluminum powder can burn violently when heated in the air and emit a dazzling white flame. It is easily soluble in dilute sulfuric acid, nitric acid, hydrochloric acid, sodium hydroxide and potassium hydroxide solution, but hardly soluble in water. The relative density is 2.70. Melting point is 660°C. The boiling point is 2327°C. The content of aluminum in the crust is second only to oxygen and silicon, ranking third, and is the most abundant metal element in the crust. The development of the three important industries of aviation, construction, and automobile requires the characteristics of materials to have the unique properties of aluminum and its alloys, which greatly facilitates the production and application of this new metal aluminum.

3N8-4N8 aluminum is mostly used for rolling aluminum foil of electrolytic capacitors, lighting fixtures and data storage. 5N-6N ultra-pure aluminum is mostly used in manufacturing semiconductor devices, manufacturing optoelectronic storage media, superconducting cable stabilization materials, and playing an important role in space shuttle scientific research. The picture below is the microscopic metallographic inspection picture of aluminum sputtering target, the average particle size is <300μm. We produce high-purity aluminum sputtering targets. Its biggest advantage is that in the process of physical vapor deposition, a thin film with excellent conductivity and particle minimization can be obtained. The following table is a certificate of composition analysis of 5N high-purity aluminum sputtering target.

图片1

Analysis methods used:

1. Use GDMS or ICP-OES to analyze metal elements;

2. Use LECO for gas element analysis.

 

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欧泰稀材
Ruthenium target, Ru sputtering target
Ruthenium target is mainly used in the field of vacuum coating<br> Purity: 99.95%<br> Uses: vacuum coating, experimental or research grade ruthenium targets, electronics, optoelectronics, military, decorative coating, functional films, etc.
osmium target, Os sputtering target
Chemical purity: 99.95%<br> Size: Diameter 20~300mm, thickness 1~60mm, customized according to requirements<br> Application: Osmium target is mainly used in the field of vacuum coating
High purity titanium target
Purity: 4N-5N <br> Dimensions: diameter 50~400mm, thickness 3~28mm<br> Can be customized according to customer requirements
Iridium target, Ir sputtering target
Purity: 3N5<br> Size: 1-10 inches, unconventional size can be customized<br> Application The high temperature oxidation resistance and thermoelectric properties of iridium make the iridium/iridium rhodium thermocouple the only precious metal temperature measurement material that can measure high temperatures up to 2100℃ in the atmosphere.
Gold target
Chemical purity:99.99%<br> Size: Diameter 20~300mm, thickness 1~60mm according to requirements
Silver target
Chemical purity: 99.99%<br> Size: Diameter 20~300mm, thickness 1~60mm according to requirements
Rhenium target, rhenium sputtering target
Specifications: Purity Re≥99.99%~99.999%, shape, size and density accept various customized products. <br> Rhenium target material is used for magnetron sputtering coating. Magnetron sputtering coating is a new type of physical vapor (PVD) coating method. Compared with evaporation coating method, it has obvious advantages in many aspects. A more mature technology, magnetron sputtering has been used in many fields, such as semiconductor integrated circuits, solar photovoltaics, recording media, flat-panel displays, and workpiece surface coatings.
Copper target
We can produce copper targets of various purity and requirements with a purity of 99.9%~99.9999%. The oxygen content can be as low as <1ppm. It is mainly used for display screen and touch screen wiring and its protective film, solar light absorption layer, semiconductor wiring, etc. industry.
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