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1氧化铟锡靶(ITO)
1氧化铟锡靶(ITO)
In2Se3 target
Purity: 99.99%
Size: 50.8mm-300mm
In2Se3 is mainly used as semiconductors, photoconductive materials, optical and electrical sensors.
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Product description

In2Se3 is mainly used as semiconductors, photoconductive materials, optical and electrical sensors.

Product performance

Composition

In,Se(2:3)

Purity

99.99%

Density

5.7g/cm3

Size

50.8mm - 300mm

Tolerance

Diameter:±0.1mm,Thickness:±0.1mm

Roughness

32RMS

 

 

硒化铟In2Se3靶

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欧泰稀材
Ruthenium target, Ru sputtering target
Ruthenium target is mainly used in the field of vacuum coating<br> Purity: 99.95%<br> Uses: vacuum coating, experimental or research grade ruthenium targets, electronics, optoelectronics, military, decorative coating, functional films, etc.
osmium target, Os sputtering target
Chemical purity: 99.95%<br> Size: Diameter 20~300mm, thickness 1~60mm, customized according to requirements<br> Application: Osmium target is mainly used in the field of vacuum coating
Iridium target, Ir sputtering target
Purity: 3N5<br> Size: 1-10 inches, unconventional size can be customized<br> Application The high temperature oxidation resistance and thermoelectric properties of iridium make the iridium/iridium rhodium thermocouple the only precious metal temperature measurement material that can measure high temperatures up to 2100℃ in the atmosphere.
Rhodium target
Purity:99.95%,round ,square<br> Modern advanced molybdenum and rhodium dual-target X-ray machine photography has become the first choice for breast examination. It has the characteristics of high definition and high contrast, and can fully show signs of microcalcification. It is currently the first choice for breast cancer screening.<br> Size:diameter Φ50~170mm thickness 3~15mm <br>
Palladium target
Pd≥99.95% <br> Application:Palladium targets are mainly used in the field of vacuum coating<br>
Gold target
Chemical purity:99.99%<br> Size: Diameter 20~300mm, thickness 1~60mm according to requirements
Silver target
Chemical purity: 99.99%<br> Size: Diameter 20~300mm, thickness 1~60mm according to requirements
Rhenium target, rhenium sputtering target
Specifications: Purity Re≥99.99%~99.999%, shape, size and density accept various customized products. <br> Rhenium target material is used for magnetron sputtering coating. Magnetron sputtering coating is a new type of physical vapor (PVD) coating method. Compared with evaporation coating method, it has obvious advantages in many aspects. A more mature technology, magnetron sputtering has been used in many fields, such as semiconductor integrated circuits, solar photovoltaics, recording media, flat-panel displays, and workpiece surface coatings.
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