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Top ten high-end specialty thin material products

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High purity tungsten target, tungsten titanium target, tantalum target, titanium target, molybdenum target, tungsten-nickel-chromium target, niobium target, iridium target, ruthenium target, osmium target, platinum target, gold target, silver target, rhodium palladium target, copper target, molybdenum niobium target, tungsten-rhenium target, aluminum-silicon target, palladium target
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Depending on the purpose of use, there are different requirements for the impurity content of high-purity tungsten targets and tungsten-titanium targets. Generally, the chemical purity is required to be between 99.99% and 99.999%. We can also customize other specifications suitable for the application according to user requirements.
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1000
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Tantalum sheets and tantalum plates can be used to manufacture various inorganic acid preparation equipment, corrosion-resistant fasteners, supporting accessories, heat shields, heaters and heat sinks in high-temperature vacuum furnaces, water tanks, bridges and other steel Structure of the cathodic protection system.
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Ruthenium target is mainly used in the field of vacuum coating<br> Purity: 99.95%<br> Uses: vacuum coating, experimental or research grade ruthenium targets, electronics, optoelectronics, military, decorative coating, functional films, etc.
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1. Purity: 99.99%; 99.999%<br> 2、Density:  ≥19.1g/cm3;<br> 3、Flatness:≤2%;  <br>
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Tungsten rhenium ratio: WRe3%, WRe5%, WRe10%, WRe25%, WRe26%<br> Size range: thickness (0.2-20) × width (≯500) × length (≯1000) <br> Our company uses solid-liquid mixing to improve the uniformity of rhenium, and at the same time, through multiple forging and annealing to increase the density and improve the structure, improve the performance and life of the anode target. <br>
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1000
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Tungsten rhenium sputtering target
Tungsten rhenium X-ray target
Tungsten Rhenium CT Tube Target
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Purity: 4N-5N <br> Dimensions: diameter 50~400mm, thickness 3~28mm<br> Can be customized according to customer requirements
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1000
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Purity specifications: 99.95%; 99.98%<br> Density: ≥10.10g/cm3<br> Organization: average grain size is less than 150 microns, typical target and surface structure
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1000
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Molybdenum target
Molybdenum sputtering target
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For Si-Al targets, the Si content can be adjusted from 50% to 90%. The material has good uniformity, high density and fine grains. Technical parameters: It is made by the method of powder metallurgy, the purity is ≥99.9%, the relative density is greater than 99%, and the size is determined according to customer requirements.
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1000
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Si-Al targets
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Purity: ≥99.95% Density: ≥8.6g/cm3 Melting point: 2468℃ <br> Supply status: cold rolled bright surface Size range: 0.025min X 500max X L<br> Uses: vacuum coating, superconductivity, flat display, touch screen
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1000
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Molybdenum Niobium Target
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Niobium is a kind of refractory rare metal with a steel-gray luster. Its melting point is 2467℃ and its density is 8.6g/cm3. Niobium has good low-temperature plasticity and can be cold-pressed into rods, sheets, wires and other products. Niobium can withstand high temperature and high strength, and still has sufficient strength, plasticity and thermal conductivity above 1000°C. Superconductivity is best at extremely low temperatures. For example, its resistance is close to zero at minus 260°C. It is currently the most important superconducting material.
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1000
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3N8-4N8 aluminum is mostly used for rolling aluminum foil of electrolytic capacitors, lighting fixtures and data storage. 5N-6N ultra-pure aluminum is mostly used in manufacturing semiconductor devices, manufacturing optoelectronic storage media, superconducting cable stabilization materials, and playing an important role in space shuttle scientific research. The picture below is the microscopic metallographic inspection picture of aluminum sputtering target, the average particle size is <300μm. We produce high-purity aluminum sputtering targets. Its biggest advantage is that in the process of physical vapor deposition, a thin film with excellent conductivity and particle minimization can be obtained. The following table is a certificate of composition analysis of 5N high-purity aluminum sputtering target.
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We can produce copper targets of various purity and requirements with a purity of 99.9%~99.9999%. The oxygen content can be as low as <1ppm. It is mainly used for display screen and touch screen wiring and its protective film, solar light absorption layer, semiconductor wiring, etc. industry.
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