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1钽靶材-光学通讯
1钽靶
1高纯钽靶
1钽靶材-光学通讯
1钽靶
1高纯钽靶
Tantalum target
Tantalum sheets and tantalum plates can be used to manufacture various inorganic acid preparation equipment, corrosion-resistant fasteners, supporting accessories, heat shields, heaters and heat sinks in high-temperature vacuum furnaces, water tanks, bridges and other steel Structure of the cathodic protection system.
0.0 0.0
Product description

Product manual

Tantalum, a metallic element, mainly exists in tantalite and co-exists with niobium. The texture of tantalum is very hard, the hardness can reach 6-6.5. Its melting point is as high as 2996℃, second only to tungsten and rhenium, ranking third. Tantalum is malleable and can be drawn into a thin wire-like foil. Its coefficient of thermal expansion is very small. It only expands by 6.6% per degree Celsius. In addition, its toughness is very strong, even better than copper. Tantalum also has extremely high corrosion resistance. It does not react to hydrochloric acid, concentrated nitric acid and "aqua regia" regardless of whether it is under cold or hot conditions.

 

 

Application

Tantalum sheets and tantalum plates can be used to manufacture various inorganic acid preparation equipment, corrosion-resistant fasteners, supporting accessories, heat shields, heaters and heat sinks in high-temperature vacuum furnaces, water tanks, bridges and other steel Structure of the cathodic protection system.

 

Standard sizes

Thickness (0.15~6.0)mm × width (50~300)mm×length (50~1000)mm, customer's special size and requirements can be negotiated

 

Chemical composition

Brand

Chemical composition  ≯%

Ta

Fe

Si

Ni

W

Mo

Ti

Nb

O

C

H

N

Ta1

Matrix

0.005

0.005

0.005

0.005

0.002

0.002

0.050

0.02

0.004

0.002

0.005

Ta2

Matrix

0.005

0.005

0.005

0.005

0.002

0.002

0.1

0.03

0.010

0.002

0.010

FTa1

Matrix

0.005

0.005

0.005

0.005

0.002

0.002

0.005

0.020

0.003

0.002

0.005

FTa2

Matrix

0.010

0.030

0.010

0.005

0.002

0.002

0.100

0.035

0.003

0.002

0.010

Ta1 and Ta2 are made of ingots, and FTa1 and FTa1 are made of vertical melting bars

 

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欧泰稀材
Ruthenium target
Ruthenium target is mainly used in the field of vacuum coating<br> Purity: 99.95%<br> Uses: vacuum coating, experimental or research grade ruthenium targets, electronics, optoelectronics, military, decorative coating, functional films, etc.
High purity titanium target
Purity: 4N-5N <br> Dimensions: diameter 50~400mm, thickness 3~28mm<br> Can be customized according to customer requirements
Rhenium target
Specifications: Purity Re≥99.99%~99.999%, shape, size and density accept various customized products. <br> Rhenium target material is used for magnetron sputtering coating. Magnetron sputtering coating is a new type of physical vapor (PVD) coating method. Compared with evaporation coating method, it has obvious advantages in many aspects. A more mature technology, magnetron sputtering has been used in many fields, such as semiconductor integrated circuits, solar photovoltaics, recording media, flat-panel displays, and workpiece surface coatings.
Mo-Re Target
product manual The ratio of molybdenum to rhenium: MoRe14%, MoRe41%, MoRe44.5%, MoRe47.5% Size range: thickness (0.2-20) × width (≯500) × length (≯1000), can be customized according to customer requirements Process flow: powder mixing → pressing → sintering → forging → annealing → machining → dynamic balance → vacuum degassing → packaging use A type of alloy formed by adding 14% to 47.5% rhenium to molybdenum. After adding rhenium, the ductility, welding performance and formability of the alloy can be greatly improved. Even after high temperature use, the molybdenum-rhenium alloy can still maintain good ductility Sex. Molybdenum-rhenium alloys are widely used in the electronics industry, nuclear industry and aerospace industry.
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