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Ru sputtering target Wholesale Price related knowledge

Ru sputtering target Wholesale Price related knowledge

  • Categories:News
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  • Time of issue:2023-03-02 16:47
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(Summary description)Before understanding the Ru sputtering target Wholesale Price, we need to know that the sputtering target is one of the main materials for preparing thin films. It has the characteristics of high purity, high density, multi-components, and uniform grains. board composition. The target blank is the core part of the sputtering target and is the target material bombarded by the high-speed ion beam.

Ru sputtering target Wholesale Price related knowledge

(Summary description)Before understanding the Ru sputtering target Wholesale Price, we need to know that the sputtering target is one of the main materials for preparing thin films. It has the characteristics of high purity, high density, multi-components, and uniform grains. board composition. The target blank is the core part of the sputtering target and is the target material bombarded by the high-speed ion beam.

  • Categories:News
  • Author:
  • Origin:
  • Time of issue:2023-03-02 16:47
  • Views:0
Information

Before understanding the Ru sputtering target Wholesale Price, we need to know that the sputtering target is one of the main materials for preparing thin films. It has the characteristics of high purity, high density, multi-components, and uniform grains. board composition. The target blank is the core part of the sputtering target and is the target material bombarded by the high-speed ion beam. After the target blank is hit by ions, its surface atoms are scattered by sputtering and deposited on the substrate to form an electronic film. Since the target needs to complete the sputtering process in a high-voltage, high-vacuum machine environment, the target blank needs to be bonded to the back plate through different welding processes. The back plate mainly plays the role of fixing the sputtering target blank. And it needs to have good electrical and thermal conductivity.

Ru sputtering target Wholesale Price
Sputtering targets are mainly used in integrated circuits, flat panel displays, solar cells, recording media, smart glass, etc., and generally require high purity and stability of the target. With the rapid development of iterative upgrading of electronic technology and thin film technology, the market demand for high-quality sputtering targets is rapidly increasing at an annual rate of nearly 15%. The obvious development trend of high-quality sputtering targets is: 4N grade or above high-purity /Ultra-high purity metal, high sputtering rate, controllable grain/crystal orientation, large size.
If you want to know the information of Ru sputtering target Wholesale Price, please pay attention to our company.

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Ru sputtering target factory Introduction Product categories
Ru sputtering target factory Introduction Product categories
Ru sputtering target factory tells you the types and classifications of sputtering targets. (1) According to the chemical composition and material of the target, the sputtering target can be divided into metal/non-metal single substance target, alloy target, ceramic/compound target, etc.
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Ru sputtering target factory tells you the types and classifications of sputtering targets.
(1) According to the chemical composition and material of the target, the sputtering target can be divided into metal/non-metal single substance target, alloy target, ceramic/compound target, etc.
Related applications of Ru sputtering target Wholesale Price
Related applications of Ru sputtering target Wholesale Price
Before understanding Ru sputtering target Wholesale Price, let's first understand the main application fields and technical requirements of sputtering targets. High-purity sputtering targets are concentrated in the four fields of flat panel display, information storage, solar cells, and chips, accounting for a total of 94%. Among them, the chip field, that is, the semiconductor industry, has the most stringent and demanding requirements for the target material. Copper, aluminum, molybdenum and ITO targets are the most common and widely used targets.
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Before understanding Ru sputtering target Wholesale Price, let's first understand the main application fields and technical requirements of sputtering targets.
High-purity sputtering targets are concentrated in the four fields of flat panel display, information storage, solar cells, and chips, accounting for a total of 94%. Among them, the chip field, that is, the semiconductor industry, has the most stringent and demanding requirements for the target material. Copper, aluminum, molybdenum and ITO targets are the most common and widely used targets.
Ru sputtering target Wholesale Price related knowledge
Ru sputtering target Wholesale Price related knowledge
Before understanding the Ru sputtering target Wholesale Price, we need to know that the sputtering target is one of the main materials for preparing thin films. It has the characteristics of high purity, high density, multi-components, and uniform grains. board composition. The target blank is the core part of the sputtering target and is the target material bombarded by the high-speed ion beam.
See more information
Before understanding the Ru sputtering target Wholesale Price, we need to know that the sputtering target is one of the main materials for preparing thin films. It has the characteristics of high purity, high density, multi-components, and uniform grains. board composition. The target blank is the core part of the sputtering target and is the target material bombarded by the high-speed ion beam.
The main purpose of Os sputtering target
The main purpose of Os sputtering target
Os sputtering target is the main raw material for the preparation of electronic thin film materials by physical vapor deposition (PVD), which is mainly composed of target blanks, back plates and other parts.
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Os sputtering target is the main raw material for the preparation of electronic thin film materials by physical vapor deposition (PVD), which is mainly composed of target blanks, back plates and other parts.
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What is the use of molybdenum powder
The application of molybdenum in the iron and steel industry occupies a very important position, accounting for about 80% of the total consumption of molybdenum, followed by the chemical industry, accounting for about 10%.
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The application of molybdenum in the iron and steel industry occupies a very important position, accounting for about 80% of the total consumption of molybdenum, followed by the chemical industry, accounting for about 10%.
Demand Background of Metal Chromium Powder for 3D Printing
Demand Background of Metal Chromium Powder for 3D Printing
In metallurgy, aviation, military industry, automobile and other fields, chromium parts have high hardness, wear resistance, high temperature resistance and other characteristics, so they are widely used.
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Properties of Spherical Tantalum Powder
In terms of material classification, tantalum powder specially used for capacitors is called capacitor grade tantalum powder.
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In terms of material classification, tantalum powder specially used for capacitors is called capacitor grade tantalum powder.
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What are the application fields of spherical tungsten powder
In the field of thermal spraying, spherical tungsten powder not only has good fluidity, but also obtains a more uniform and dense coating. Thus the product has better wear resistance.
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In the field of thermal spraying, spherical tungsten powder not only has good fluidity, but also obtains a more uniform and dense coating. Thus the product has better wear resistance.
Demand for spherical chromium powder
Demand for spherical chromium powder
In metallurgy, aviation, military industry, automobile and other fields, chromium parts have high hardness, wear resistance, high temperature resistance and other characteristics, so they are widely used.
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In metallurgy, aviation, military industry, automobile and other fields, chromium parts have high hardness, wear resistance, high temperature resistance and other characteristics, so they are widely used.
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