Before understanding the Ru sputtering target Wholesale Price, we need to know that the sputtering target is one of the main materials for preparing thin films. It has the characteristics of high purity, high density, multi-components, and uniform grains. board composition. The target blank is the core part of the sputtering target and is the target material bombarded by the high-speed ion beam. After the target blank is hit by ions, its surface atoms are scattered by sputtering and deposited on the substrate to form an electronic film. Since the target needs to complete the sputtering process in a high-voltage, high-vacuum machine environment, the target blank needs to be bonded to the back plate through different welding processes. The back plate mainly plays the role of fixing the sputtering target blank. And it needs to have good electrical and thermal conductivity.

Sputtering targets are mainly used in integrated circuits, flat panel displays, solar cells, recording media, smart glass, etc., and generally require high purity and stability of the target. With the rapid development of iterative upgrading of electronic technology and thin film technology, the market demand for high-quality sputtering targets is rapidly increasing at an annual rate of nearly 15%. The obvious development trend of high-quality sputtering targets is: 4N grade or above high-purity /Ultra-high purity metal, high sputtering rate, controllable grain/crystal orientation, large size.
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