Tungsten powder factory briefly introduces spherical tungsten powder for you
Tungsten powder factory will introduce to you that metal tungsten with high melting point and high hardness is an important strategic material, which is widely used in tungsten carbide tools, electric filaments, tool steel additives, rockets, spacecraft, nuclear reactors and other fields. With the development of science and technology, new special requirements are constantly put forward for raw material tungsten powder. For example, high-quality cemented carbide requires ultra-fine tungsten powder; electronic materials and filter materials require spherical tungsten powder.
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Tungsten powder factory will introduce to you that metal tungsten with high melting point and high hardness is an important strategic material, which is widely used in tungsten carbide tools, electric filaments, tool steel additives, rockets, spacecraft, nuclear reactors and other fields. With the development of science and technology, new special requirements are constantly put forward for raw material tungsten powder. For example, high-quality cemented carbide requires ultra-fine tungsten powder; electronic materials and filter materials require spherical tungsten powder.
Ru sputtering target factory introduces product demand trends for you
Ru sputtering target factory will introduce to you: the sputtering target industry chain is basically distributed in a pyramid, mainly including four links: metal purification, target manufacturing, sputtering coating and terminal application. Among them, metal purification and target manufacturing are the most important basic links of raw materials in the electronics industry,
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Ru sputtering target factory will introduce to you: the sputtering target industry chain is basically distributed in a pyramid, mainly including four links: metal purification, target manufacturing, sputtering coating and terminal application. Among them, metal purification and target manufacturing are the most important basic links of raw materials in the electronics industry,
Ru sputtering target factory Introduction Product categories
Ru sputtering target factory tells you the types and classifications of sputtering targets.
(1) According to the chemical composition and material of the target, the sputtering target can be divided into metal/non-metal single substance target, alloy target, ceramic/compound target, etc.
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Ru sputtering target factory tells you the types and classifications of sputtering targets.
(1) According to the chemical composition and material of the target, the sputtering target can be divided into metal/non-metal single substance target, alloy target, ceramic/compound target, etc.
Related applications of Ru sputtering target Wholesale Price
Before understanding Ru sputtering target Wholesale Price, let's first understand the main application fields and technical requirements of sputtering targets.
High-purity sputtering targets are concentrated in the four fields of flat panel display, information storage, solar cells, and chips, accounting for a total of 94%. Among them, the chip field, that is, the semiconductor industry, has the most stringent and demanding requirements for the target material. Copper, aluminum, molybdenum and ITO targets are the most common and widely used targets.
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Before understanding Ru sputtering target Wholesale Price, let's first understand the main application fields and technical requirements of sputtering targets.
High-purity sputtering targets are concentrated in the four fields of flat panel display, information storage, solar cells, and chips, accounting for a total of 94%. Among them, the chip field, that is, the semiconductor industry, has the most stringent and demanding requirements for the target material. Copper, aluminum, molybdenum and ITO targets are the most common and widely used targets.
Ru sputtering target Wholesale Price related knowledge
Before understanding the Ru sputtering target Wholesale Price, we need to know that the sputtering target is one of the main materials for preparing thin films. It has the characteristics of high purity, high density, multi-components, and uniform grains. board composition. The target blank is the core part of the sputtering target and is the target material bombarded by the high-speed ion beam.
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Before understanding the Ru sputtering target Wholesale Price, we need to know that the sputtering target is one of the main materials for preparing thin films. It has the characteristics of high purity, high density, multi-components, and uniform grains. board composition. The target blank is the core part of the sputtering target and is the target material bombarded by the high-speed ion beam.