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Molybdenum target
Purity specifications: 99.95%; 99.98%
Density: ≥10.10g/cm3
Organization: average grain size is less than 150 microns, typical target and surface structure
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Product description

Specification range: (10-20) mm×(200-1450) mm×≤3000 mm

Specifications of the supplied products:


15mm×133mm×778mm 19mm×200mm×2700mm

10mm×885mm×960mm 14mm×1400mm×1700mm


Purity specifications: 99.95%; 99.98%

Density: ≥10.10g/cm3

Structure: average grain size is less than 150 microns, typical target and surface structure

As shown in the figure below: Average hardness range: HV180-200 Ultrasonic flaw detection: The maximum equivalent defect is not more than 0.5mm;



the microstructure of rectangular target

Wide molybdenum metallographic



Molybdenum target
Molybdenum sputtering target
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Ruthenium target, Ru sputtering target
Ruthenium target is mainly used in the field of vacuum coating<br> Purity: 99.95%<br> Uses: vacuum coating, experimental or research grade ruthenium targets, electronics, optoelectronics, military, decorative coating, functional films, etc.
Tantalum target,Ta sputtering target
Tantalum target is usually welded with the copper back target, and then semiconductor or optical sputtering is carried out to deposit tantalum atoms as oxides on the substrate material to achieve sputtering coating.
osmium target, Os sputtering target
Chemical purity: 99.95%<br> Size: Diameter 20~300mm, thickness 1~60mm, customized according to requirements<br> Application: Osmium target is mainly used in the field of vacuum coating
Niobium target
Niobium is a kind of refractory rare metal with a steel-gray luster. Its melting point is 2467℃ and its density is 8.6g/cm3. Niobium has good low-temperature plasticity and can be cold-pressed into rods, sheets, wires and other products. Niobium can withstand high temperature and high strength, and still has sufficient strength, plasticity and thermal conductivity above 1000°C. Superconductivity is best at extremely low temperatures. For example, its resistance is close to zero at minus 260°C. It is currently the most important superconducting material.
Rhenium target, rhenium sputtering target
Specifications: Purity Re≥99.99%~99.999%, shape, size and density accept various customized products. <br> Rhenium target material is used for magnetron sputtering coating. Magnetron sputtering coating is a new type of physical vapor (PVD) coating method. Compared with evaporation coating method, it has obvious advantages in many aspects. A more mature technology, magnetron sputtering has been used in many fields, such as semiconductor integrated circuits, solar photovoltaics, recording media, flat-panel displays, and workpiece surface coatings.
High purity titanium target
Purity: 4N-5N <br> Dimensions: diameter 50~400mm, thickness 3~28mm<br> Can be customized according to customer requirements
Mo-Re Target
product manual The ratio of molybdenum to rhenium: MoRe14%, MoRe41%, MoRe44.5%, MoRe47.5% Size range: thickness (0.2-20) × width (≯500) × length (≯1000), can be customized according to customer requirements Process flow: powder mixing → pressing → sintering → forging → annealing → machining → dynamic balance → vacuum degassing → packaging use A type of alloy formed by adding 14% to 47.5% rhenium to molybdenum. After adding rhenium, the ductility, welding performance and formability of the alloy can be greatly improved. Even after high temperature use, the molybdenum-rhenium alloy can still maintain good ductility Sex. Molybdenum-rhenium alloys are widely used in the electronics industry, nuclear industry and aerospace industry.
Iridium target, Ir sputtering target
Purity: 3N5<br> Size: 1-10 inches, unconventional size can be customized<br> Application The high temperature oxidation resistance and thermoelectric properties of iridium make the iridium/iridium rhodium thermocouple the only precious metal temperature measurement material that can measure high temperatures up to 2100℃ in the atmosphere.
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