UMM
EN

CN

中文 /  EN
language
中国
韩国
韩国
韩国
韩国
韩国
imgboxbg
imgboxbg

Products Center

Top ten high-end specialty thin material products

搜索
Search

Products

All categories
1铌溅射靶材Niobium sputtering target_副本
1铌靶材-光学通讯
1铌溅射靶材Niobium sputtering target_副本
1铌靶材-光学通讯
Niobium target
Niobium is a kind of refractory rare metal with a steel-gray luster. Its melting point is 2467℃ and its density is 8.6g/cm3. Niobium has good low-temperature plasticity and can be cold-pressed into rods, sheets, wires and other products. Niobium can withstand high temperature and high strength, and still has sufficient strength, plasticity and thermal conductivity above 1000°C. Superconductivity is best at extremely low temperatures. For example, its resistance is close to zero at minus 260°C. It is currently the most important superconducting material.
0.0 0.0
Product description

Description

Niobium is a kind of refractory rare metal with a steel-gray luster. Its melting point is 2467℃ and its density is 8.6g/cm3. Niobium has good low-temperature plasticity and can be cold-pressed into rods, sheets, wires and other products. Niobium can withstand high temperature and high strength, and still has sufficient strength, plasticity and thermal conductivity above 1000°C. Superconductivity is best at extremely low temperatures. For example, its resistance is close to zero at minus 260°C. It is currently the most important superconducting material.

 

Application

Niobium and high-temperature niobium-tungsten alloy materials are widely used in aerospace engines, weapon propellers, rocket missile liquid two-component engines, nuclear reactors, submersibles, gas turbines, automobile engines, diesel engines, high-temperature furnace heating belts, high-temperature molds, high-temperature fixtures And the manufacture of high-temperature crucibles. Specification size Thickness (0.15~6.0)mm × width (50~300)mm×length (50~1000)mm, customer's special size and requirements can be negotiated

 

Chemical composition

Brand

Chemical composition ,≯(%)

Nb1

Fe

Si

Ni

W

Mo

Ti

Cr

0.005

0.005

0.005

0.010

0.010

0.002

0.002

O

C

H

N

Ta

Nb

 

0.020

0.020

0.001

0.01

0.10

Matrix

 

Nb2

Fe

Si

Ni

W

Mo

Ti

Cr

0.01

0.005

0.005

0.020

0.010

0.005

0.005

O

C

H

N

Ta

Nb

 

0.040

0.030

0.005

0.025

0.25

Matrix

 

 

 

1铌溅射靶材Niobiumsputteringtarget

We could not find any corresponding parameters, please add them to the properties table

Everyone is watching

欧泰稀材
Ruthenium target, Ru sputtering target
Ruthenium target is mainly used in the field of vacuum coating<br> Purity: 99.95%<br> Uses: vacuum coating, experimental or research grade ruthenium targets, electronics, optoelectronics, military, decorative coating, functional films, etc.
osmium target, Os sputtering target
Chemical purity: 99.95%<br> Size: Diameter 20~300mm, thickness 1~60mm, customized according to requirements<br> Application: Osmium target is mainly used in the field of vacuum coating
Iridium target, Ir sputtering target
Purity: 3N5<br> Size: 1-10 inches, unconventional size can be customized<br> Application The high temperature oxidation resistance and thermoelectric properties of iridium make the iridium/iridium rhodium thermocouple the only precious metal temperature measurement material that can measure high temperatures up to 2100℃ in the atmosphere.
Gold target
Chemical purity:99.99%<br> Size: Diameter 20~300mm, thickness 1~60mm according to requirements
Silver target
Chemical purity: 99.99%<br> Size: Diameter 20~300mm, thickness 1~60mm according to requirements
Rhenium target, rhenium sputtering target
Specifications: Purity Re≥99.99%~99.999%, shape, size and density accept various customized products. <br> Rhenium target material is used for magnetron sputtering coating. Magnetron sputtering coating is a new type of physical vapor (PVD) coating method. Compared with evaporation coating method, it has obvious advantages in many aspects. A more mature technology, magnetron sputtering has been used in many fields, such as semiconductor integrated circuits, solar photovoltaics, recording media, flat-panel displays, and workpiece surface coatings.
High purity titanium target
Purity: 4N-5N <br> Dimensions: diameter 50~400mm, thickness 3~28mm<br> Can be customized according to customer requirements
Copper target
We can produce copper targets of various purity and requirements with a purity of 99.9%~99.9999%. The oxygen content can be as low as <1ppm. It is mainly used for display screen and touch screen wiring and its protective film, solar light absorption layer, semiconductor wiring, etc. industry.
Previous page
1