Ion implantation is a kind of material surface modification high and new technology that has been vigorously developed and widely used internationally in the past 30 years. It has realized the optimization of the surface performance of the material or can obtain some new excellent performance. Due to the unique and prominent features of this high-tech, it is a very important technology in modern integrated circuit manufacturing. It uses an ion implanter to achieve semiconductor doping and change the conductivity of the semiconductor and the structure of the transistor.