Application of Gold in High-end Manufacturing-Electronic Semiconductor
Gold has been considered a valuable precious metal since ancient times, and its unique chemical and physical properties have led to its extensive use in various fields. It serves as both a special reserve and investment currency, dominates the jewelry industry, and plays a crucial role in modern industries such as telecommunications, aerospace, and aviation. In the field of electronic device manufacturing, gold is highly regarded for its excellent conductivity. Gold's conductivity is not only superior to common conductive metals like copper and silver but also exhibits excellent stability in extreme environments such as high temperatures, high pressures, and low temperatures. Therefore, gold finds wide applications in semiconductors and electronic components.
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Gold has been considered a valuable precious metal since ancient times, and its unique chemical and physical properties have led to its extensive use in various fields. It serves as both a special reserve and investment currency, dominates the jewelry industry, and plays a crucial role in modern industries such as telecommunications, aerospace, and aviation. In the field of electronic device manufacturing, gold is highly regarded for its excellent conductivity. Gold's conductivity is not only superior to common conductive metals like copper and silver but also exhibits excellent stability in extreme environments such as high temperatures, high pressures, and low temperatures. Therefore, gold finds wide applications in semiconductors and electronic components.
Overview of Vacuum Ion Coating
With the rapid development of science and technology, the mechanical manufacturing industry plays an increasingly important role in production. Corrosion on the surfaces of mechanical components is a major issue in the industry. Therefore, improving surface hardness, wear resistance, corrosion resistance, and other properties of the components is crucial in the field of mechanical manufacturing. Coating the surface of components is one of the most commonly used methods to enhance their performance. However, coating technologies have several drawbacks. For example, the adhesion of coatings is poor, leading to easy delamination. There is also a significant difference in thermal expansion coefficients between the coating and the substrate material, making the coating prone to cracking. These limitations restrict their practical application in production.
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With the rapid development of science and technology, the mechanical manufacturing industry plays an increasingly important role in production. Corrosion on the surfaces of mechanical components is a major issue in the industry. Therefore, improving surface hardness, wear resistance, corrosion resistance, and other properties of the components is crucial in the field of mechanical manufacturing. Coating the surface of components is one of the most commonly used methods to enhance their performance. However, coating technologies have several drawbacks. For example, the adhesion of coatings is poor, leading to easy delamination. There is also a significant difference in thermal expansion coefficients between the coating and the substrate material, making the coating prone to cracking. These limitations restrict their practical application in production.
Overview of Chemical Vapor Deposition (CVD) Coating
With the continuous improvement in the requirements of aerospace, nuclear industry, semiconductors, and other fields for semiconductor devices, integrated circuits, high-field and small-sized superconducting materials, and crystal growth products, chemical vapor deposition technology has a broad market application prospect as an essential method for material preparation and effective surface modification. Some researchers predict that CVD will focus on reducing harmful by-products and increasing industrial-scale production in the future. Additionally, the development of lower-temperature CVD processes, more precise control over CVD processes, thick film deposition techniques, novel film materials, and new material synthesis technologies will be the major areas of research in the future.
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With the continuous improvement in the requirements of aerospace, nuclear industry, semiconductors, and other fields for semiconductor devices, integrated circuits, high-field and small-sized superconducting materials, and crystal growth products, chemical vapor deposition technology has a broad market application prospect as an essential method for material preparation and effective surface modification. Some researchers predict that CVD will focus on reducing harmful by-products and increasing industrial-scale production in the future. Additionally, the development of lower-temperature CVD processes, more precise control over CVD processes, thick film deposition techniques, novel film materials, and new material synthesis technologies will be the major areas of research in the future.
Overview of Evaporative Coating and Its Material Selection
Vacuum evaporation coating refers to a technique of obtaining thin films by heating and evaporating a certain substance under vacuum conditions to deposit it on the surface of the substrate material. The substance that has been evaporated is called a evaporative material. Evaporative coating was first proposed by M. Faraday in 1857 and has become one of the mainstream coating technologies after over a hundred years of development.
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Vacuum evaporation coating refers to a technique of obtaining thin films by heating and evaporating a certain substance under vacuum conditions to deposit it on the surface of the substrate material. The substance that has been evaporated is called a evaporative material. Evaporative coating was first proposed by M. Faraday in 1857 and has become one of the mainstream coating technologies after over a hundred years of development.
What are the characteristics of high-quality sputtering targets?
PVD (Physical Vapor Deposition) technology is one of the main technologies for preparing thin film materials. Under vacuum conditions, physical methods are used to vaporize a material into gaseous atoms, molecules, or partially ionize it into ions, and through a low-pressure gas (or plasma) process, thin film materials with special functions such as transparency enhancement, reflection, protective conductivity, magnetic conductivity, insulation, corrosion resistance, oxidation resistance, radiation protection, and decoration are deposited on the surface of the substrate material. T
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PVD (Physical Vapor Deposition) technology is one of the main technologies for preparing thin film materials. Under vacuum conditions, physical methods are used to vaporize a material into gaseous atoms, molecules, or partially ionize it into ions, and through a low-pressure gas (or plasma) process, thin film materials with special functions such as transparency enhancement, reflection, protective conductivity, magnetic conductivity, insulation, corrosion resistance, oxidation resistance, radiation protection, and decoration are deposited on the surface of the substrate material. T
Overview of Vacuum Coating Materials And Technologies
Vacuum sputter coating. It refers to the technique of using ions generated by an ion source, which are accelerated and gathered in a vacuum to form a high ion beams, to bombard the surface of the target (coating material), where kinetic energy is exchanged between the ions and the atoms on the surface of the target, causing the atoms on the surface of the target to leave and be deposited on the surface of the substrate material. The object bombarded with ions is the raw material for the deposition of thin film materials by the vacuum sputtering method and is called a sputtering target.
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Vacuum sputter coating. It refers to the technique of using ions generated by an ion source, which are accelerated and gathered in a vacuum to form a high ion beams, to bombard the surface of the target (coating material), where kinetic energy is exchanged between the ions and the atoms on the surface of the target, causing the atoms on the surface of the target to leave and be deposited on the surface of the substrate material. The object bombarded with ions is the raw material for the deposition of thin film materials by the vacuum sputtering method and is called a sputtering target.
Application and preparation method of spherical powder
Spherical powders have been widely used in many fields because of their good fluidity and high density. In the field of thermal spraying, the spherical powder makes the coating more uniform and dense because of its good fluidity, so the coating has better wear resistance; In the field of powder metallurgy, the forming parts prepared by spherical powder have high density and uniform shrinkage in the sintering process, so the products obtained have high precision and good performance. It has obvious advantages in the application of advanced powder metallurgy forming technology such as injection molding, gel injection molding and additive manufacturing (such as 3D printing technology).
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Spherical powders have been widely used in many fields because of their good fluidity and high density. In the field of thermal spraying, the spherical powder makes the coating more uniform and dense because of its good fluidity, so the coating has better wear resistance; In the field of powder metallurgy, the forming parts prepared by spherical powder have high density and uniform shrinkage in the sintering process, so the products obtained have high precision and good performance. It has obvious advantages in the application of advanced powder metallurgy forming technology such as injection molding, gel injection molding and additive manufacturing (such as 3D printing technology).
Platinum group metals have been grinding for a decade, and the future is not to be underestimated
As the "newborn" of the metal family, platinum group precious metals play an indispensable role from the transformation of the traditional petrochemical industry to the whole industrial chain of new energy, including hydrogen energy, and will eventually play an important role in the development of the 21st century!
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As the "newborn" of the metal family, platinum group precious metals play an indispensable role from the transformation of the traditional petrochemical industry to the whole industrial chain of new energy, including hydrogen energy, and will eventually play an important role in the development of the 21st century!
Advantages and disadvantages of friction stir welding
The main advantages of friction stir welding are as follows:
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The main advantages of friction stir welding are as follows:
