UMM
language
中国
韩国
韩国
韩国
韩国
韩国
imgboxbg

Industry News

Learn more about us through the industry

搜索
Search

News

Your location:
Homepage
/
/
The development prospects of Tantalum target

The development prospects of Tantalum target

  • Categories:News
  • Author:
  • Origin:
  • Time of issue:2021-09-20 18:09
  • Views:0

(Summary description)Target grain size and distribution of Tantalum target: Generally, the target material has a polycrystalline structure, and the grain size can be on the order of micrometers to millimeters.

The development prospects of Tantalum target

(Summary description)Target grain size and distribution of Tantalum target: Generally, the target material has a polycrystalline structure, and the grain size can be on the order of micrometers to millimeters.

  • Categories:News
  • Author:
  • Origin:
  • Time of issue:2021-09-20 18:09
  • Views:0
Information

Target grain size and distribution of Tantalum target: Generally, the target material has a polycrystalline structure, and the grain size can be on the order of micrometers to millimeters. For targets of the same composition, the sputtering rate of fine-grained targets is faster than that of coarse-grained Tantalum targets, while targets with smaller grain sizes have a more uniform deposition film thickness distribution.

Tantalum target

The target material manufactured by the vacuum melting method can ensure that there are no holes in the block, but the Tantalum target manufactured by the powder metallurgy method may contain a certain number of holes. The presence of holes will cause abnormal discharge during the sputtering process, resulting in impurity particles. In addition, due to its low density, targets with holes are easily broken during operation, transportation, installation and operation.

The Tantalum target manufacturer tells you that the processing technology of Tantalum target: The processing technology of sputtering target used in integrated circuit manufacturing mainly includes smelting, homogenization, pressure processing and mechanical processing. On the basis of strictly controlling the purity of the target material, the chromium target material, the niobium target material and the titanium aluminum target material can adjust the grain orientation and grain size of the target material by optimizing the pressure treatment process, heat treatment conditions and mechanical processing conditions.
Target impurity control for high-purity chromium targets: If there are too many inclusions in the target, particles may form on the wafer during the sputtering process, resulting in short-circuit or disconnection of interconnections, which seriously affects performance.

Most of the inclusions in Tantalum target are formed during the smelting and casting process, mainly composed of oxides, but also include nitrides, carbides, hydrides, sulfides, silicides, etc., so they should be used in the casting process . Before Tantalum target is cast, oxides and other slag on the surface of the melt should be removed. Generally, they are melted and cast in a vacuum or oxygen-free environment. The price of Tantalum target on the market is also different.

Keyword:

Scan the QR code to read on your phone

Top dynamic rankings

Metal vanadium powder use
Metal vanadium powder use
With the rapid development of the level of science and technology, human's requirements for new materials are increasing day by day.
See more information
With the rapid development of the level of science and technology, human's requirements for new materials are increasing day by day.
Application of spherical vanadium powder
Application of spherical vanadium powder
Vanadium has many excellent physical and chemical properties, so vanadium has a wide range of uses and is known as a metal "vitamin". At first, vanadium was mostly used in steel.
See more information
Vanadium has many excellent physical and chemical properties, so vanadium has a wide range of uses and is known as a metal "vitamin". At first, vanadium was mostly used in steel.
Application of rhenium material
Application of rhenium material
Alloys or coating materials composed of rhenium and tungsten, molybdenum or platinum group metals are widely used in the electronics industry because of their high melting point,
See more information
Alloys or coating materials composed of rhenium and tungsten, molybdenum or platinum group metals are widely used in the electronics industry because of their high melting point,
Application of rhenium target
Application of rhenium target
Rhenium target is used for magnetron sputtering coating. Magnetron sputtering coating is a new type of physical vapor phase (PVD) coating method.
See more information
Rhenium target is used for magnetron sputtering coating. Magnetron sputtering coating is a new type of physical vapor phase (PVD) coating method.
rhenium target manufacturers tell you the rhenium market
rhenium target manufacturers tell you the rhenium market
The market demand for rhenium is closely related to the development of high-tech industries. As a strategic material, the main consumer countries of rhenium are the United States, Western Europe, Japan and other developed countries and the military power Russia.
See more information
The market demand for rhenium is closely related to the development of high-tech industries. As a strategic material, the main consumer countries of rhenium are the United States, Western Europe, Japan and other developed countries and the military power Russia.
The working principle of Os sputtering target
The working principle of Os sputtering target
The Os sputtering target is mainly composed of target blank, back plate and other parts. The target blank belongs to the target material bombarded by high-speed ion beams and is the core part.
See more information
The Os sputtering target is mainly composed of target blank, back plate and other parts. The target blank belongs to the target material bombarded by high-speed ion beams and is the core part.
What is a sputtering target
What is a sputtering target
A sputtering target is a material for making thin films by sputter deposition or thin film deposition techniques.
See more information
A sputtering target is a material for making thin films by sputter deposition or thin film deposition techniques.
How to choose 3D printing spherical tungsten powder
How to choose 3D printing spherical tungsten powder
Therefore, metal powder is at the heart of metal 3D printing. The amount of tungsten powder in metal 3D printing is also very large, so what kind of quality is better for spherical tungsten powder?
See more information
Therefore, metal powder is at the heart of metal 3D printing. The amount of tungsten powder in metal 3D printing is also very large, so what kind of quality is better for spherical tungsten powder?
Domestic production method of spherical tungsten powder
Domestic production method of spherical tungsten powder
The spherical tungsten powder has a spherical appearance, and has the remarkable characteristics of good powder fluidity and high tap density compared with ordinary tungsten powder.
See more information
The spherical tungsten powder has a spherical appearance, and has the remarkable characteristics of good powder fluidity and high tap density compared with ordinary tungsten powder.
UMM

Scan the QR code and follow the official account

EN

CN

Ultra Minor Metals Ltd (UMM) all rights reserved       湘ICP备17001881号       by:www.300.cnchangsha