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Application fields of vanadium powder

Application fields of vanadium powder

(Summary description)Vanadium-titanium alloys are widely used in aircraft engines, aerospace cabin skeletons, missiles, hydrofoils and introducers of warships, steam turbine blades, rocket engine casings, etc.

Application fields of vanadium powder

(Summary description)Vanadium-titanium alloys are widely used in aircraft engines, aerospace cabin skeletons, missiles, hydrofoils and introducers of warships, steam turbine blades, rocket engine casings, etc.

Information

1. Aerospace industry
Vanadium-titanium alloys are widely used in aircraft engines, aerospace cabin skeletons, missiles, hydrofoils and introducers of warships, steam turbine blades, rocket engine casings, etc. In addition, vanadium alloys are also used in magnetic materials, hard alloys, C-conducting materials and nuclear reactor materials.

Spherical vanadium powder suppliers china

2. Steel industry
About 85% of metallic vanadium is added to steel production in the form of ferrovanadium and vanadium-nitrogen alloys to improve the strength, toughness, ductility and heat resistance of steel. Vanadium-containing high-strength alloy steel is widely used in the production and construction of oil/gas pipelines, buildings, bridges, and rails. Vanadium-containing high-strength alloy steel mainly includes: high-strength low-alloy (HSLA) steel (comprehensive); HSLA steel plate; HSLA section steel; HSLA strip steel; advanced high-strength strip steel; and die steel, etc.
3. Chemical industry
In the chemical industry, vanadium compounds are used in catalysts, ceramic colorants, developers, desiccants and raw materials for the production of high-purity vanadium oxide or ferrovanadium. V205 has special activity as a catalyst, and other elements are difficult to replace.

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Ru sputtering target factory Introduction Product categories
Ru sputtering target factory Introduction Product categories
Ru sputtering target factory tells you the types and classifications of sputtering targets. (1) According to the chemical composition and material of the target, the sputtering target can be divided into metal/non-metal single substance target, alloy target, ceramic/compound target, etc.
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Ru sputtering target factory tells you the types and classifications of sputtering targets.
(1) According to the chemical composition and material of the target, the sputtering target can be divided into metal/non-metal single substance target, alloy target, ceramic/compound target, etc.
Related applications of Ru sputtering target Wholesale Price
Related applications of Ru sputtering target Wholesale Price
Before understanding Ru sputtering target Wholesale Price, let's first understand the main application fields and technical requirements of sputtering targets. High-purity sputtering targets are concentrated in the four fields of flat panel display, information storage, solar cells, and chips, accounting for a total of 94%. Among them, the chip field, that is, the semiconductor industry, has the most stringent and demanding requirements for the target material. Copper, aluminum, molybdenum and ITO targets are the most common and widely used targets.
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Before understanding Ru sputtering target Wholesale Price, let's first understand the main application fields and technical requirements of sputtering targets.
High-purity sputtering targets are concentrated in the four fields of flat panel display, information storage, solar cells, and chips, accounting for a total of 94%. Among them, the chip field, that is, the semiconductor industry, has the most stringent and demanding requirements for the target material. Copper, aluminum, molybdenum and ITO targets are the most common and widely used targets.
Ru sputtering target Wholesale Price related knowledge
Ru sputtering target Wholesale Price related knowledge
Before understanding the Ru sputtering target Wholesale Price, we need to know that the sputtering target is one of the main materials for preparing thin films. It has the characteristics of high purity, high density, multi-components, and uniform grains. board composition. The target blank is the core part of the sputtering target and is the target material bombarded by the high-speed ion beam.
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