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1钨铼靶2
钨铼靶
1钨铼靶2
钨铼靶
Tungsten rhenium target
Tungsten rhenium ratio: WRe3%, WRe5%, WRe10%, WRe25%, WRe26%
Size range: thickness (0.2-20) × width (≯500) × length (≯1000)
Our company uses solid-liquid mixing to improve the uniformity of rhenium, and at the same time, through multiple forging and annealing to increase the density and improve the structure, improve the performance and life of the anode target.
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Product description

Product manual

Tungsten rhenium ratio: WRe3%, WRe5%, WRe10%, WRe25%, WRe26%

Size range: thickness (0.2-20) × width (≯500) × length (≯1000)

Our company uses solid-liquid mixing to improve the uniformity of rhenium, and at the same time, through multiple forging and annealing to increase the density and improve the structure, improve the performance and life of the anode target.

Process flow: powder mixing → pressing → sintering → forging → annealing → machining → dynamic balance → vacuum degassing → packaging

 

Application

Tungsten has a high melting point and can generate X-rays when irradiated by a high-speed electron beam. Therefore, it is often used as an X-ray source for various X-ray tubes. Tungsten-rhenium targets combine high strength, toughness, heat resistance and high It has advantages such as precision and supports high-power electron beams, and is often used in medical X-ray tubes. At the same time, tungsten rhenium targets are also widely used in magnetron sputtering.

 

Keyword:
Tungsten rhenium sputtering target
Tungsten rhenium X-ray target
Tungsten Rhenium CT Tube Target
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欧泰稀材
Ruthenium target
Ruthenium target is mainly used in the field of vacuum coating<br> Purity: 99.95%<br> Uses: vacuum coating, experimental or research grade ruthenium targets, electronics, optoelectronics, military, decorative coating, functional films, etc.
High purity titanium target
Purity: 4N-5N <br> Dimensions: diameter 50~400mm, thickness 3~28mm<br> Can be customized according to customer requirements
Rhenium target
Specifications: Purity Re≥99.99%~99.999%, shape, size and density accept various customized products. <br> Rhenium target material is used for magnetron sputtering coating. Magnetron sputtering coating is a new type of physical vapor (PVD) coating method. Compared with evaporation coating method, it has obvious advantages in many aspects. A more mature technology, magnetron sputtering has been used in many fields, such as semiconductor integrated circuits, solar photovoltaics, recording media, flat-panel displays, and workpiece surface coatings.
Mo-Re Target
product manual The ratio of molybdenum to rhenium: MoRe14%, MoRe41%, MoRe44.5%, MoRe47.5% Size range: thickness (0.2-20) × width (≯500) × length (≯1000), can be customized according to customer requirements Process flow: powder mixing → pressing → sintering → forging → annealing → machining → dynamic balance → vacuum degassing → packaging use A type of alloy formed by adding 14% to 47.5% rhenium to molybdenum. After adding rhenium, the ductility, welding performance and formability of the alloy can be greatly improved. Even after high temperature use, the molybdenum-rhenium alloy can still maintain good ductility Sex. Molybdenum-rhenium alloys are widely used in the electronics industry, nuclear industry and aerospace industry.
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