UMM
EN

CN

language
中国
韩国
韩国
韩国
韩国
韩国
imgboxbg

Industry News

Learn more about us through the industry

搜索
Search

News

Your location:
Homepage
/
/
The development prospects of Tantalum target

The development prospects of Tantalum target

  • Categories:News
  • Author:
  • Origin:
  • Time of issue:2021-09-20 18:09
  • Views:0

(Summary description)Target grain size and distribution of Tantalum target: Generally, the target material has a polycrystalline structure, and the grain size can be on the order of micrometers to millimeters.

The development prospects of Tantalum target

(Summary description)Target grain size and distribution of Tantalum target: Generally, the target material has a polycrystalline structure, and the grain size can be on the order of micrometers to millimeters.

  • Categories:News
  • Author:
  • Origin:
  • Time of issue:2021-09-20 18:09
  • Views:0
Information

Target grain size and distribution of Tantalum target: Generally, the target material has a polycrystalline structure, and the grain size can be on the order of micrometers to millimeters. For targets of the same composition, the sputtering rate of fine-grained targets is faster than that of coarse-grained Tantalum targets, while targets with smaller grain sizes have a more uniform deposition film thickness distribution.

Tantalum target

The target material manufactured by the vacuum melting method can ensure that there are no holes in the block, but the Tantalum target manufactured by the powder metallurgy method may contain a certain number of holes. The presence of holes will cause abnormal discharge during the sputtering process, resulting in impurity particles. In addition, due to its low density, targets with holes are easily broken during operation, transportation, installation and operation.

The Tantalum target manufacturer tells you that the processing technology of Tantalum target: The processing technology of sputtering target used in integrated circuit manufacturing mainly includes smelting, homogenization, pressure processing and mechanical processing. On the basis of strictly controlling the purity of the target material, the chromium target material, the niobium target material and the titanium aluminum target material can adjust the grain orientation and grain size of the target material by optimizing the pressure treatment process, heat treatment conditions and mechanical processing conditions.
Target impurity control for high-purity chromium targets: If there are too many inclusions in the target, particles may form on the wafer during the sputtering process, resulting in short-circuit or disconnection of interconnections, which seriously affects performance.

Most of the inclusions in Tantalum target are formed during the smelting and casting process, mainly composed of oxides, but also include nitrides, carbides, hydrides, sulfides, silicides, etc., so they should be used in the casting process . Before Tantalum target is cast, oxides and other slag on the surface of the melt should be removed. Generally, they are melted and cast in a vacuum or oxygen-free environment. The price of Tantalum target on the market is also different.

Keyword:

Scan the QR code to read on your phone

Top dynamic rankings

The extraction process of rhenium pellet
The extraction process of rhenium pellet
There are two methods for industrial production of rhenium pellets: high temperature sintering method and smelting method.
See more information
There are two methods for industrial production of rhenium pellets: high temperature sintering method and smelting method.
Application field of Tantalum target
Application field of Tantalum target
The technological development trend of Tantalum target materials is closely related to the development trend of thin film technology in the downstream application industry.
See more information
The technological development trend of Tantalum target materials is closely related to the development trend of thin film technology in the downstream application industry.
The development prospects of Tantalum target
The development prospects of Tantalum target
Target grain size and distribution of Tantalum target: Generally, the target material has a polycrystalline structure, and the grain size can be on the order of micrometers to millimeters.
See more information
Target grain size and distribution of Tantalum target: Generally, the target material has a polycrystalline structure, and the grain size can be on the order of micrometers to millimeters.
Three major functions of Titanium Target
Three major functions of Titanium Target
Titanium Target has one-way, two-way and omnidirectional memory effects at a certain ambient temperature, and is recognized as the best memory alloy.
See more information
Titanium Target has one-way, two-way and omnidirectional memory effects at a certain ambient temperature, and is recognized as the best memory alloy.
About target binding
About target binding
Recommended target materials for binding: Os sputtering target, Ru sputtering target, rhenium target, Ta sputtering target, Ir sputtering target, ceramic brittle targets and sintered targets; tin, indium and other soft metal targets; targets are too thin, targets Too expensive, etc.
See more information
Recommended target materials for binding: Os sputtering target, Ru sputtering target, rhenium target, Ta sputtering target, Ir sputtering target, ceramic brittle targets and sintered targets; tin, indium and other soft metal targets; targets are too thin, targets Too expensive, etc.
Use of Iridium ingot
Use of Iridium ingot
Most applications of Iridium ingot use its high melting point, high hardness and corrosion resistance. Iridium ingot metal, iridium-platinum alloy and osmium-iridium alloy have very low consumption and can be used to make porous spinnerets.
See more information
Most applications of Iridium ingot use its high melting point, high hardness and corrosion resistance. Iridium ingot metal, iridium-platinum alloy and osmium-iridium alloy have very low consumption and can be used to make porous spinnerets.
Uses and application fields of rhenium pellet
Uses and application fields of rhenium pellet
The global reserves of rhenium are very small and the price is relatively expensive. In the application, alloys containing rhenium are mostly used. As an alloy additive element, rhenium can greatly improve and enhance the properties of the alloy.
See more information
The global reserves of rhenium are very small and the price is relatively expensive. In the application, alloys containing rhenium are mostly used. As an alloy additive element, rhenium can greatly improve and enhance the properties of the alloy.
Various thin films can be produced by magnetron sputtering on Rhenium target substrate
Various thin films can be produced by magnetron sputtering on Rhenium target substrate
This paper describes the possibility of producing various thin films by magnetron sputtering on Rhenium target substrates.
See more information
This paper describes the possibility of producing various thin films by magnetron sputtering on Rhenium target substrates.
Application of rhenium target in sputtering coating
Application of rhenium target in sputtering coating
This article briefly introduces the application of rhenium target
See more information
This article briefly introduces the application of rhenium target
UMM

Scan the QR code and follow the official account